http://nanolab.wiki.uib.no/api.php?action=feedcontributions&feedformat=atom&user=Tre043 2026-04-11T13:10:39Z User contributions MediaWiki 1.44.2 http://nanolab.wiki.uib.no/index.php?title=E-Line_Calendar/E-Line/4-26-2012_-Event_2&diff=316 2012-04-26T10:00:59Z

<p>Tre043: Blanked the page</p> <hr /> <div></div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=E-Line_Calendar/E-Line/4-26-2012_-Event_2&diff=315 2012-04-26T10:00:37Z

<p>Tre043: Created page with &#039;9:00-10:00 thomas r&#039;</p> <hr /> <div>9:00-10:00 thomas r</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=E-Line_Calendar/E-Line/4-20-2012_-Event_1&diff=310 2012-04-20T10:21:41Z

<p>Tre043: Created page with &#039;12:00-16:00 photonic crystals&#039;</p> <hr /> <div>12:00-16:00 photonic crystals</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:SOP_Plasmatherm.doc&diff=309 2012-04-19T06:55:23Z

<p>Tre043: </p> <hr /> <div></div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=E-Line_Calendar/E-Line/4-17-2012_-Event_1&diff=308 2012-04-17T08:08:41Z

<p>Tre043: Created page with &#039;10:00-13:00 Thomas og Jan Olav, Photonic Crystal Dose matrix and Etch Test&#039;</p> <hr /> <div>10:00-13:00 Thomas og Jan Olav, Photonic Crystal Dose matrix and Etch Test</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=305 2012-03-22T14:53:19Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> Here is a description of the available facilities: [[File:Facilities.doc||Facilities Documentation]].<br /> <br /> Here is a summary of the maintenance documents: [[File:Facilities_Maintenance.doc||Facilities Maintenance Documentation]].<br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas R|Thomas Reisinger]]<br /> * [[Erik|Erik Mannseth]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas B|Thomas Bolstad]]<br /> * [[Thomas H|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:<br /> <br /> * MIT open courseware on nano processing [http://ocw.mit.edu/courses/electrical-engineering-and-computer-science/6-152j-micro-nano-processing-technology-fall-2005/]<br /> * Resources at Chalmers (Swedish Nano-processing lab)[http://www.chalmers.se/mc2/EN/laboratories/nanofabrication/education-training/micro-nanoprocessing]<br /> * Useful recipes at Brigham Young University [http://www.cleanroom.byu.edu/]<br /> * Wikibook on Microtechnology [http://en.wikibooks.org/wiki/Microtechnology]<br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=304 2012-03-22T14:48:44Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> Here is a description of the available facilities: [[File:Facilities.doc||Facilities Documentation]].<br /> <br /> Here is a summary of the maintenance documents: [[File:Facilities_Maintenance.doc||Facilities Maintenance Documentation]].<br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas R|Thomas Reisinger]]<br /> * [[Erik|Erik Mannseth]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas B|Thomas Bolstad]]<br /> * [[Thomas H|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> * MIT open courseware on nano processing [http://ocw.mit.edu/courses/electrical-engineering-and-computer-science/6-152j-micro-nano-processing-technology-fall-2005/]<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Filmetrics_F-10_Calendar&diff=303 2012-03-22T14:46:48Z

<p>Tre043: Created page with &#039;&lt;calendar name=&quot;Filmetrics F-10&quot; editdefault usetemplates /&gt;&#039;</p> <hr /> <div>&lt;calendar name=&quot;Filmetrics F-10&quot; editdefault usetemplates /&gt;</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Convection_Oven_Calendar&diff=302 2012-03-22T14:46:31Z

<p>Tre043: Created page with &#039;&lt;calendar name=&quot;Convection Oven&quot; editdefault usetemplates /&gt;&#039;</p> <hr /> <div>&lt;calendar name=&quot;Convection Oven&quot; editdefault usetemplates /&gt;</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Jarand&diff=301 2012-03-22T14:30:49Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Jarand.Gauteplass&#039;</p> <hr /> <div>http://www.uib.no/persons/Jarand.Gauteplass</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Rachid&diff=300 2012-03-22T14:30:17Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Rachid.Maad&#039;</p> <hr /> <div>http://www.uib.no/persons/Rachid.Maad</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Martin&diff=299 2012-03-22T14:26:43Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Martin.Greve&#039;</p> <hr /> <div>http://www.uib.no/persons/Martin.Greve</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Bjoern&diff=298 2012-03-22T14:26:19Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Bjorn.Samelin&#039;</p> <hr /> <div>http://www.uib.no/persons/Bjorn.Samelin</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Bodil&diff=297 2012-03-22T14:24:46Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Bodil.Holst&#039;</p> <hr /> <div>http://www.uib.no/persons/Bodil.Holst</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=296 2012-03-22T14:24:07Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> Here is a description of the available facilities: [[File:Facilities.doc||Facilities Documentation]].<br /> <br /> Here is a summary of the maintenance documents: [[File:Facilities_Maintenance.doc||Facilities Maintenance Documentation]].<br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas R|Thomas Reisinger]]<br /> * [[Erik|Erik Mannseth]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas B|Thomas Bolstad]]<br /> * [[Thomas H|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Thomas_R&diff=295 2012-03-22T14:23:27Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Thomas.Reisinger&#039;</p> <hr /> <div>http://www.uib.no/persons/Thomas.Reisinger</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=294 2012-03-22T14:22:54Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> Here is a description of the available facilities: [[File:Facilities.doc||Facilities Documentation]].<br /> <br /> Here is a summary of the maintenance documents: [[File:Facilities_Maintenance.doc||Facilities Maintenance Documentation]].<br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas R|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas B|Thomas Bolstad]]<br /> * [[Thomas H|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Thomas1&diff=293 2012-03-22T14:22:21Z

<p>Tre043: Created page with &#039;http://www.uib.no/persons/Thomas.Reisinger&#039;</p> <hr /> <div>http://www.uib.no/persons/Thomas.Reisinger</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Xiaodong&diff=292 2012-03-22T14:21:25Z

<p>Tre043: Created page with &#039;http://www.uib.no/personer/Xiaodong.Guo&#039;</p> <hr /> <div>http://www.uib.no/personer/Xiaodong.Guo</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=291 2012-03-22T14:20:39Z

<p>Tre043: </p> <hr /> <div>http://www.uib.no/personer/Erik.Mannseth</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=290 2012-03-22T14:18:42Z

<p>Tre043: </p> <hr /> <div>#REDIRECT http://www.uib.no/personer/Erik.Mannseth</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=289 2012-03-22T14:18:26Z

<p>Tre043: </p> <hr /> <div>#REDIRECT [http://www.uib.no/personer/Erik.Mannseth|Erik Mannseth]</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=288 2012-03-22T14:17:57Z

<p>Tre043: Redirected page to Http://www.uib.no/personer/Erik.Mannseth</p> <hr /> <div>#REDIRECT [[http://www.uib.no/personer/Erik.Mannseth|Erik Mannseth]]</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=287 2012-03-22T14:17:33Z

<p>Tre043: </p> <hr /> <div>#REDIRECT http://www.uib.no/personer/Erik.Mannseth</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=286 2012-03-22T14:14:49Z

<p>Tre043: </p> <hr /> <div>#REDIRECT [http://www.uib.no/personer/Erik.Mannseth]</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=285 2012-03-22T14:13:10Z

<p>Tre043: Redirected page to Http://www.uib.no/personer/Erik.Mannseth</p> <hr /> <div>#REDIRECT [[http://www.uib.no/personer/Erik.Mannseth]]</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Erik&diff=284 2012-03-22T14:12:35Z

<p>Tre043: Created page with &#039;#REDIRECT http://www.uib.no/personer/Erik.Mannseth&#039;</p> <hr /> <div>#REDIRECT http://www.uib.no/personer/Erik.Mannseth</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=283 2012-03-22T14:09:47Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> Here is a description of the available facilities: [[File:Facilities.doc||Facilities Documentation]].<br /> <br /> Here is a summary of the maintenance documents: [[File:Facilities_Maintenance.doc||Facilities Maintenance Documentation]].<br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:Facilities_Maintenance.doc&diff=282 2012-03-22T14:09:24Z

<p>Tre043: Assembled documentation of Maintenance of various facilities available at UiB&#039;s Nanostructures Laboratory.</p> <hr /> <div>Assembled documentation of Maintenance of various facilities available at UiB's Nanostructures Laboratory.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:Facilities.doc&diff=281 2012-03-22T14:07:53Z

<p>Tre043: Description of the facilities available at UiB&#039;s NanoStructures laboratory.</p> <hr /> <div>Description of the facilities available at UiB's NanoStructures laboratory.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=280 2012-03-22T14:07:11Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> Here is a description of the available facilities: [[File:Facilities.doc||Facilities Documentation]].<br /> <br /> Here is a summary of the maintenance documents: [[File:Facilities_Maintenance.doc||Facilities Maintenance Documentation]].<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=279 2012-03-22T12:56:37Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Convection Oven Calendar|Convection Oven Reservation Calendar]]<br /> ** SOP: [[File:SOP_convectionoven.doc||Convection Oven SOP]]<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=278 2012-03-22T12:55:20Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SputterCoater.doc||Sputter Coater SOP]]<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:SOP_Temescal_Maintenance.doc&diff=277 2012-03-22T12:45:31Z

<p>Tre043: Temescal FC-2000 Maintenance SOP</p> <hr /> <div>Temescal FC-2000 Maintenance SOP</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=276 2012-03-22T12:44:35Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Temescal_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:SOP_Temescal.doc&diff=275 2012-03-22T12:43:52Z

<p>Tre043: Temescal FC-2000 SOP</p> <hr /> <div>Temescal FC-2000 SOP</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Spin_Coater_Calendar&diff=274 2012-03-22T12:43:09Z

<p>Tre043: Created page with &#039;&lt;calendar name=&quot;Spin Coater&quot; editdefault usetemplates /&gt;&#039;</p> <hr /> <div>&lt;calendar name=&quot;Spin Coater&quot; editdefault usetemplates /&gt;</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Temescal_Calendar&diff=273 2012-03-22T12:42:42Z

<p>Tre043: Created page with &#039;&lt;calendar name=&quot;Temescal FC-2000&quot; editdefault usetemplates /&gt;&#039;</p> <hr /> <div>&lt;calendar name=&quot;Temescal FC-2000&quot; editdefault usetemplates /&gt;</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:SOP_Plasmatherm_Maintenance.doc&diff=272 2012-03-22T12:41:54Z

<p>Tre043: Plasmatherm Maintenance SOP</p> <hr /> <div>Plasmatherm Maintenance SOP</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:SOP_Raith_E-Line_Maintenance.doc&diff=271 2012-03-22T12:30:26Z

<p>Tre043: Maintenance SOP for e-Line</p> <hr /> <div>Maintenance SOP for e-Line</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=270 2012-03-22T12:29:41Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm 790+ Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]<br /> ** SOP: [[File:SOP_Temescal.doc||Temescal FC-2000 SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Temescal FC-2000 Maintenance SOP]]<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]<br /> ** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Plasmatherm_Calendar&diff=269 2012-03-22T12:14:01Z

<p>Tre043: Created page with &#039;&lt;calendar name=&quot;Plasmatherm 790+&quot; editdefault usetemplates /&gt;&#039;</p> <hr /> <div>&lt;calendar name=&quot;Plasmatherm 790+&quot; editdefault usetemplates /&gt;</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=268 2012-03-22T12:10:09Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> ** Owner: [[Xiaodong|Xiaodong Guo]]<br /> ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]<br /> ** SOP: [[File:SOP_Plasmatherm.doc||Plasmatherm 790+ SOP]]<br /> ** Maintenance: [[File:SOP_Plasmatherm_Maintenance.doc||Plasmatherm Maintenance SOP]]<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=267 2012-03-22T12:07:23Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> ** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> ** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> ** Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=266 2012-03-22T12:06:49Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> ** Owner: [[Erik|Erik Mannseth]]<br /> <br /> Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> <br /> SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> <br /> Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=265 2012-03-22T12:06:34Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> <br /> ** Owner: [[Erik|Erik Mannseth]]<br /> <br /> Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> <br /> SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> <br /> Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=264 2012-03-22T12:05:40Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> <br /> **Owner: [[Erik|Erik Mannseth]]<br /> <br /> Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> <br /> SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> <br /> Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=Main_Page&diff=262 2012-03-22T10:38:06Z

<p>Tre043: </p> <hr /> <div>= Wiki for UiB's NanoStructures Laboratory. =<br /> <br /> UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.<br /> <br /> We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. <br /> <br /> == Equipment and Standard Operating Procedures (SOPs)==<br /> <br /> * Electron-beam lithography: Raith e-Line<br /> <br /> Owner: [[Erik|Erik Mannseth]]<br /> <br /> Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]<br /> <br /> SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]<br /> <br /> Maintenance: [[File:SOP_Raith_E-Line_Maintenance.doc||e-Line Maintenance SOP]]<br /> <br /> * Reactive-ion etcher: Plasmatherm 790+<br /> <br /> * Electron-beam evaporator: Temescal FC-2000<br /> <br /> * UV-lithography setup<br /> <br /> * Spin-coater<br /> <br /> * Convection Oven<br /> <br /> * Hotplates<br /> <br /> * Ultrasonic Bath<br /> <br /> * Sputter coater<br /> <br /> * Thin-film characterization: Filmetrics F-10<br /> <br /> * [[Cleanroom|ISO-class 5 cleanroom]]<br /> * [[Fumehood Cleanroom|Cleanroom Fumehood]]<br /> * [[Fumehood Outerlab|Outerlab Fumehood]]<br /> <br /> * Lift-off<br /> <br /> * Chrome wet-etch<br /> <br /> <br /> * old link: [[Procedures|Standard Operating Procedures]]<br /> * old link: [[Tools|Available fabrication tools and facilities]]<br /> <br /> == Facilities ==<br /> <br /> <br /> * [[DI-Water|De-ionized water unit]]<br /> * [[Neutralizer|Waste Water Neutralizer]]<br /> * [[Scrubber|Exhaust Scrubber for fumehood exhaust]]<br /> * [[Cooling Water|Cooling Water]]<br /> * [[Nitrogen|Nitrogen 5.0 Pressure Swing Adsorption Unit]]<br /> * [[Electricity|Information on Electricity]]<br /> * [[Air Conditioning|Air Conditioning]]<br /> * [[Pressurized Air|Pressurized Air]]<br /> * [[Chemical Storage|Storage for Chemicals]]<br /> <br /> == Laboratory Documents ==<br /> <br /> * [[Rules|Laboratory Code of Conduct / Clothing rules]]<br /> * [[Safety|Safety Guidelines and Information]]<br /> * [[Cleaning|Lab Cleaning Procedures]]<br /> * [[Consumables|Available consumables and supplier information]]<br /> <br /> == People ==<br /> <br /> * [[Bodil|Bodil Holst]]<br /> * [[Bjoern|Bjørn Samelin]]<br /> * [[Thomas1|Thomas Reisinger]]<br /> * [[Xiaodong|Xiaodong Guo]]<br /> * [[Martin|Martin Greve]]<br /> * [[Rachid|Rachid Maad]]<br /> * [[Thomas2|Thomas Bolstad]]<br /> * [[Thomas3|Thomas Håvardstun]]<br /> * [[Jarand|Jarand Gauteplass]]<br /> <br /> <br /> == Further Information ==<br /> <br /> <br /> = Information on using MediaWiki =<br /> <br /> * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list]<br /> * [http://www.mediawiki.org/wiki/Manual:FAQ MediaWiki FAQ]<br /> * [https://lists.wikimedia.org/mailman/listinfo/mediawiki-announce MediaWiki release mailing list]<br /> <br /> Consult the [http://meta.wikimedia.org/wiki/Help:Contents User's Guide] for information on using the wiki software.</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=File:SOP_Raith_E-Line.doc&diff=261 2012-03-22T10:08:22Z

<p>Tre043: Standard Operating Procedure for the e-Line at UiB&#039;s NanoStructures Laboratory</p> <hr /> <div>Standard Operating Procedure for the e-Line at UiB's NanoStructures Laboratory</div>

Tre043 http://nanolab.wiki.uib.no/index.php?title=E-Line_Calendar/E-Line/3-22-2012_-Event_2&diff=260 2012-03-21T16:01:31Z

<p>Tre043: Created page with &#039;9:00-12:00 Laser Fiber cleaning Thomas&amp;Erik&#039;</p> <hr /> <div>9:00-12:00 Laser Fiber cleaning Thomas&amp;Erik</div>

Tre043