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UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning. | UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning. | ||
In addition we have several imaging and analysis tools like Optical Microscopes, an AFM, a Thin Film measurements system and a Contact Angle measurement system. | |||
We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. | We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. | ||
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* Nanogroup lab-spaces: Clean room and chemical lab-spaces as well as characterisation tools | * Nanogroup lab-spaces: Clean room and chemical lab-spaces as well as characterisation tools | ||
** Primary staff: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ** Primary staff / Contact: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Access: to access the Nanogroup lab-spaces one requires an introduction and basic training by UiB personnel. | ** Access: to access the Nanogroup lab-spaces one requires an introduction and basic training by UiB personnel. | ||
_______________________________________________ | _______________________________________________ | ||
* Electron-beam lithography: Raith e-Line | * Electron-beam lithography: Raith e-Line | ||
** Reservation: e-line google calendar | ** Reservation: e-line google calendar | ||
** SOP imaginng: [[:File:Raith_imaging SOP_2023.pdf]] | ** SOP imaginng: [[:File:Raith_imaging SOP_2023.pdf]] | ||
| Line 19: | Line 20: | ||
* Sputter coater | * Sputter coater | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP: [[:File:SOP_Mini_SputterCoater_2023.pdf]] | ** SOP: [[:File:SOP_Mini_SputterCoater_2023.pdf]] | ||
_______________________________________________ | _______________________________________________ | ||
* Electron-beam evaporator: Temescal FC-2000 | * Electron-beam evaporator: Temescal FC-2000 | ||
** Reservation: Temescal google calendar | ** Reservation: Temescal google calendar | ||
** SOP: [[:File:SOP_Temescal_EbeamEvaporator_2023.pdf]] | ** SOP: [[:File:SOP_Temescal_EbeamEvaporator_2023.pdf]] | ||
| Line 30: | Line 29: | ||
* Optical microscope & Stereomicroscope: Nikon Eclipse LV100ND & Nikon SMZ 1500 | * Optical microscope & Stereomicroscope: Nikon Eclipse LV100ND & Nikon SMZ 1500 | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP Eclipse LV100ND: [[:File:SOP_Nikon_LV_1000_2023.pdf]] | ** SOP Eclipse LV100ND: [[:File:SOP_Nikon_LV_1000_2023.pdf]] | ||
| Line 37: | Line 35: | ||
* Contact Angle Measurement System: dataphysics OCA 20L | * Contact Angle Measurement System: dataphysics OCA 20L | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP: [[:File:SOP_Contact Angle_2023.pdf]] | ** SOP: [[:File:SOP_Contact Angle_2023.pdf]] | ||
| Line 43: | Line 40: | ||
* Mask Aligner: High End Mask Aligner MJB4 SÜSS Micro Tec | * Mask Aligner: High End Mask Aligner MJB4 SÜSS Micro Tec | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP: [[:File:SOP_Mask Aligner_2023.pdf]] | ** SOP: [[:File:SOP_Mask Aligner_2023.pdf]] | ||
| Line 49: | Line 45: | ||
_______________________________________________ | _______________________________________________ | ||
* Reactive-ion etcher: Plasmatherm 790+ | * Reactive-ion etcher: Plasmatherm 790+ | ||
** Reservation: Plasmatherm google calendar | ** Reservation: Plasmatherm google calendar | ||
** SOP: [[:File:SOP_Plasmatherm_790Plus_2023.pdf]] | ** SOP: [[:File:SOP_Plasmatherm_790Plus_2023.pdf]] | ||
** Maintenance: [[:File: | ** Maintenance: [[:File:SOP_Plasmatherm_790Plus_Maintenance_2023.pdf]] | ||
* UV-lithography setup | * UV-lithography setup | ||
** Reservation: no reservation needed | |||
** SOP: direct training | |||
* Spin-coater | * Spin-coater | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP: [[:File: | ** SOP: [[:File:SOP_Laurell WS 400BX Spin coater_2023.pdf]] | ||
** Manual: [[:File:LITE_Manual_WE-400BX_Spin coater_c.pdf]] | |||
* Thin-film characterization: Filmetrics F-10 | * Thin-film characterization: Filmetrics F-10 | ||
** | ** Reservation: no reservation needed | ||
** Reservation: [[ | ** SOP: [[:File:SOP_Filmetrics_2023.pdf]] | ||
** | _______________________________________________ | ||
* Atomic Force Microscope: Jupiter AFM Oxford Instruments - Asylumn Research | |||
** Reservation: AFM google calendar | |||
** SOP: [[:File:SOP_Jupiter AFM_2023.pdf]] | |||
** Manual: | |||
*** AR Jupiter User Guide_19C: ask Sabrina for .pdf file. | |||
*** AR Applications Guide_19C: ask Sabrina for .pdf file. | |||
_______________________________________________ | |||
* Fluorination Chamber: SPTS XETCH | |||
** Reservation: no reservation needed | |||
** SOP: [[:File:SOP_XetchX3_Fluorination chamber_2023.pdf]] | |||
** Manual:[[:File:Xactic-XetchX3-System-Manual.pdf]] | |||
== Procedures == | == Procedures == | ||
| Line 80: | Line 81: | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] | ||
** SOP: [[:File:SOP_chromewetech_2014.pdf]] | ** SOP: [[:File:SOP_chromewetech_2014.pdf]] | ||
* old link: [[Procedures|Standard Operating Procedures]] | * old link: [[Procedures|Standard Operating Procedures]] | ||
| Line 86: | Line 86: | ||
== Facilities == | == Facilities == | ||
*Equipment in nanolab: [[:File:Equipment in Nano-Lab_2015.pdf]] | *Equipment in nanolab: [[:File:Nanogroup Instrumentation_2023.pdf]] | ||
* Old Equipment list 2015: [[:File:Equipment in Nano-Lab_2015.pdf]] | |||
Here is a description of the available facilities: [[:File:Facilities_2014.pdf]]. | Here is a description of the available facilities (old): [[:File:Facilities_2014.pdf]]. | ||
Here is a summary of the maintenance documents: [[:File:Facilities_Maintenance-2014.pdf]]. | Here is a summary of the maintenance documents (old): [[:File:Facilities_Maintenance-2014.pdf]]. | ||
* [[DI-Water|De-ionized water unit and Neutraliser]] | * [[DI-Water|De-ionized water unit and Neutraliser]] | ||
| Line 107: | Line 108: | ||
* [[Consumables|Available consumables/chemicals and supplier information]] | * [[Consumables|Available consumables/chemicals and supplier information]] | ||
* [[Main chemicals which should be always available]] | * [[Main chemicals which should be always available]] | ||
* | * Ordering: please contact Sabrina | ||
== Laboratory Documents == | == Laboratory Documents == | ||
*Basic rules for the laboratory (Rules|Laboratory Code of Conduct/Clothing rules, Safety|Safety Guidelines and Information, Cleaning|Waste disposal) | *Basic rules for the laboratory (Rules|Laboratory Code of Conduct/Clothing rules, Safety|Safety Guidelines and Information, Cleaning|Waste disposal) | ||
** SOP:[[:File: | ** SOP:[[:File:Basics for the laboratory_2024.pdf]] | ||
*Alarm signals and power failures | *Alarm signals and power failures | ||
**SOP:[[:File:SOP_Alarm signals_Power failure_2015.pdf]] | **SOP:[[:File:SOP_Alarm signals_Power failure_2015.pdf]] | ||
== People == | == People == | ||
Professors / Engineers / Researchers / Post Doc`s | |||
* [[Martin|Martin Greve]] | * [[Martin|Martin Greve]] | ||
* [[Bodil|Bodil Holst]] | * [[Bodil|Bodil Holst]] | ||
| Line 150: | Line 140: | ||
* [[Minh Chi To]] | * [[Minh Chi To]] | ||
* [[John Benjamin Lothe]] | * [[John Benjamin Lothe]] | ||
Guideline for new employees/students at ift | |||
**Campus map [[:File:Guideline_campus map.pdf]] | |||
== Further Information == | == Further Information == | ||
Latest revision as of 09:41, 6 February 2024
Wiki for UiB's NanoStructures Laboratory.
UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.
In addition we have several imaging and analysis tools like Optical Microscopes, an AFM, a Thin Film measurements system and a Contact Angle measurement system.
We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.
Equipment and Standard Operating Procedures (SOPs)
- Nanogroup lab-spaces: Clean room and chemical lab-spaces as well as characterisation tools
- Primary staff / Contact: Martin Greve & Sabrina Eder
- Access: to access the Nanogroup lab-spaces one requires an introduction and basic training by UiB personnel.
_______________________________________________
- Electron-beam lithography: Raith e-Line
- Reservation: e-line google calendar
- SOP imaginng: File:Raith_imaging SOP_2023.pdf
- SOP lithography: File:SOP_Raith_E-Line_2023.pdf
- Maintenance: File:SOP_Raith_E-Line_Maintenance_2023.pdf
- Sputter coater
- Reservation: no reservation needed
- SOP: File:SOP_Mini_SputterCoater_2023.pdf
_______________________________________________
- Electron-beam evaporator: Temescal FC-2000
- Reservation: Temescal google calendar
- SOP: File:SOP_Temescal_EbeamEvaporator_2023.pdf
- Maintenance: File:SOP_Temescal_EbeamEvaporator_Maintenance_2023.pdf
- Optical microscope & Stereomicroscope: Nikon Eclipse LV100ND & Nikon SMZ 1500
- Reservation: no reservation needed
- SOP Eclipse LV100ND: File:SOP_Nikon_LV_1000_2023.pdf
- SOP SMZ 1500: File:SOP_Nikon_SMZ 1500_Stereomicroscope_2023.pdf
- Manual Eclipse LV100ND: ask Sabrina for .pdf file.
- Contact Angle Measurement System: dataphysics OCA 20L
- Reservation: no reservation needed
- SOP: File:SOP_Contact Angle_2023.pdf
- Manual OCA 206 E: ask Sabrina for .pdf file.
- Mask Aligner: High End Mask Aligner MJB4 SÜSS Micro Tec
- Reservation: no reservation needed
- SOP: File:SOP_Mask Aligner_2023.pdf
- Manual MJB-4: ask Sabrina for .pdf file.
_______________________________________________
- Reactive-ion etcher: Plasmatherm 790+
- Reservation: Plasmatherm google calendar
- SOP: File:SOP_Plasmatherm_790Plus_2023.pdf
- Maintenance: File:SOP_Plasmatherm_790Plus_Maintenance_2023.pdf
- UV-lithography setup
- Reservation: no reservation needed
- SOP: direct training
- Spin-coater
- Reservation: no reservation needed
- SOP: File:SOP_Laurell WS 400BX Spin coater_2023.pdf
- Manual: File:LITE_Manual_WE-400BX_Spin coater_c.pdf
- Thin-film characterization: Filmetrics F-10
- Reservation: no reservation needed
- SOP: File:SOP_Filmetrics_2023.pdf
_______________________________________________
- Atomic Force Microscope: Jupiter AFM Oxford Instruments - Asylumn Research
- Reservation: AFM google calendar
- SOP: File:SOP_Jupiter AFM_2023.pdf
- Manual:
- AR Jupiter User Guide_19C: ask Sabrina for .pdf file.
- AR Applications Guide_19C: ask Sabrina for .pdf file.
_______________________________________________
- Fluorination Chamber: SPTS XETCH
- Reservation: no reservation needed
- SOP: File:SOP_XetchX3_Fluorination chamber_2023.pdf
- Manual:File:Xactic-XetchX3-System-Manual.pdf
Procedures
- Lift-off
- Chrome wet-etch
- Owner: Martin Greve
- SOP: File:SOP_chromewetech_2014.pdf
- old link: Standard Operating Procedures
- old link: Available fabrication tools and facilities
Facilities
- Equipment in nanolab: File:Nanogroup Instrumentation_2023.pdf
- Old Equipment list 2015: File:Equipment in Nano-Lab_2015.pdf
Here is a description of the available facilities (old): File:Facilities_2014.pdf.
Here is a summary of the maintenance documents (old): File:Facilities_Maintenance-2014.pdf.
- De-ionized water unit and Neutraliser
- Cooling Water
- Nitrogen 5.0 Pressure Swing Adsorption Unit
- Air Conditioning/Ventilation
- Pressurized Air and Nitrogen Supply
- Sketch_NanoLab
- Equipment File:Nano-Lab equipment_2014.png
- Safety File:Nano-Lab safety_2014.png
- Power sockets/electricity File:Nano-Lab power sockets_2014.png
Chemicals and Consumables
- Waste/Disposal
- Available consumables/chemicals and supplier information
- Main chemicals which should be always available
- Ordering: please contact Sabrina
Laboratory Documents
- Basic rules for the laboratory (Rules|Laboratory Code of Conduct/Clothing rules, Safety|Safety Guidelines and Information, Cleaning|Waste disposal)
- Alarm signals and power failures
People
Professors / Engineers / Researchers / Post Doc`s
PhD students
MSc-Students
Guideline for new employees/students at ift
- Campus map File:Guideline_campus map.pdf
Further Information
There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:
- MIT open course ware on nano processing [1]
- Resources at Chalmers (Swedish Nano-processing lab)[2]
- Useful recipes at Brigham Young University [3]
- Wikibook on Microtechnology [4]
Information on using MediaWiki
Consult the User's Guide for information on using the wiki software.