Main Page: Difference between revisions

From Wiki for UiB's NanoStructures Laboratory
No edit summary
 
Line 81: Line 81:
** Owner: [[Martin|Martin Greve]]
** Owner: [[Martin|Martin Greve]]
** SOP: [[:File:SOP_chromewetech_2014.pdf]]
** SOP: [[:File:SOP_chromewetech_2014.pdf]]


* old link: [[Procedures|Standard Operating Procedures]]
* old link: [[Procedures|Standard Operating Procedures]]

Latest revision as of 09:41, 6 February 2024

Wiki for UiB's NanoStructures Laboratory.

UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.

In addition we have several imaging and analysis tools like Optical Microscopes, an AFM, a Thin Film measurements system and a Contact Angle measurement system.

We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.

Equipment and Standard Operating Procedures (SOPs)

  • Nanogroup lab-spaces: Clean room and chemical lab-spaces as well as characterisation tools
    • Primary staff / Contact: Martin Greve & Sabrina Eder
    • Access: to access the Nanogroup lab-spaces one requires an introduction and basic training by UiB personnel.

_______________________________________________

_______________________________________________

  • Contact Angle Measurement System: dataphysics OCA 20L
  • Mask Aligner: High End Mask Aligner MJB4 SÜSS Micro Tec

_______________________________________________

  • UV-lithography setup
    • Reservation: no reservation needed
    • SOP: direct training

_______________________________________________

  • Atomic Force Microscope: Jupiter AFM Oxford Instruments - Asylumn Research
    • Reservation: AFM google calendar
    • SOP: File:SOP_Jupiter AFM_2023.pdf
    • Manual:
      • AR Jupiter User Guide_19C: ask Sabrina for .pdf file.
      • AR Applications Guide_19C: ask Sabrina for .pdf file.

_______________________________________________

Procedures

  • Lift-off

Facilities

Here is a description of the available facilities (old): File:Facilities_2014.pdf.

Here is a summary of the maintenance documents (old): File:Facilities_Maintenance-2014.pdf.

Chemicals and Consumables

Laboratory Documents

People

Professors / Engineers / Researchers / Post Doc`s


PhD students


MSc-Students


Guideline for new employees/students at ift

Further Information

There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:

  • MIT open course ware on nano processing [1]
  • Resources at Chalmers (Swedish Nano-processing lab)[2]
  • Useful recipes at Brigham Young University [3]
  • Wikibook on Microtechnology [4]

Information on using MediaWiki

Consult the User's Guide for information on using the wiki software.

Retrieved from "http://nanolab.wiki.uib.no/index.php?title=Main_Page&oldid=2038"