Main Page: Difference between revisions
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* Electron-beam lithography: Raith e-Line | * Electron-beam lithography: Raith e-Line | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: e-line google calendar | ** Reservation: e-line google calendar | ||
** SOP imaginng: [[:File:Raith_imaging SOP_2023.pdf]] | ** SOP imaginng: [[:File:Raith_imaging SOP_2023.pdf]] | ||
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* Sputter coater | * Sputter coater | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP: [[:File:SOP_Mini_SputterCoater_2023.pdf]] | ** SOP: [[:File:SOP_Mini_SputterCoater_2023.pdf]] | ||
* Reactive-ion etcher: Plasmatherm 790+ | * Reactive-ion etcher: Plasmatherm 790+ | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]] | ** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]] | ||
** SOP: [[:File:SOP_Plasmatherm_2014.pdf]] | ** SOP: [[:File:SOP_Plasmatherm_2014.pdf]] | ||
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* Electron-beam evaporator: Temescal FC-2000 | * Electron-beam evaporator: Temescal FC-2000 | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]] | ** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]] | ||
** SOP: [[:File:SOP_Temescal_EbeamEvaporator-1_2014.pdf]] | ** SOP: [[:File:SOP_Temescal_EbeamEvaporator-1_2014.pdf]] | ||
Line 38: | Line 38: | ||
* Spin-coater | * Spin-coater | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]] | ** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]] | ||
** SOP: [[:File:SOP_SpinCoater_2014.pdf]] | ** SOP: [[:File:SOP_SpinCoater_2014.pdf]] | ||
* Sputter coater | * Sputter coater | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: no reservation needed | ** Reservation: no reservation needed | ||
** SOP: [[:File:SOP_Mini_SputterCoater_2023.pdf]] | ** SOP: [[:File:SOP_Mini_SputterCoater_2023.pdf]] | ||
* Thin-film characterization: Filmetrics F-10 | * Thin-film characterization: Filmetrics F-10 | ||
** Owner: [[Martin|Martin Greve]] | ** Owner: [[Martin|Martin Greve]] & [[Sabrina|Sabrina Eder]] | ||
** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]] | ** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]] | ||
** SOP: [[:File:SOP_Filmetrics_2014.pdf]] | ** SOP: [[:File:SOP_Filmetrics_2014.pdf]] |
Revision as of 14:05, 15 November 2023
Wiki for UiB's NanoStructures Laboratory.
UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.
We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.
Equipment and Standard Operating Procedures (SOPs)
- Nanogroup lab-spaces: Clean room and chemical lab-spaces as well as characterisation tools
- Primary staff: Martin Greve & Sabrina Eder
- Access: to access the Nanogroup lab-spaces one requires an introduction and basic training by UiB personnel.
- Electron-beam lithography: Raith e-Line
- Owner: Martin Greve & Sabrina Eder
- Reservation: e-line google calendar
- SOP imaginng: File:Raith_imaging SOP_2023.pdf
- SOP lithography: File:SOP_Raith_E-Line_2023.pdf
- Maintenance: File:SOP_Raith_E-Line_Maintenance_2023.pdf
- Sputter coater
- Owner: Martin Greve & Sabrina Eder
- Reservation: no reservation needed
- SOP: File:SOP_Mini_SputterCoater_2023.pdf
- Reactive-ion etcher: Plasmatherm 790+
- Owner: Martin Greve & Sabrina Eder
- Reservation: Plasmatherm Reservation Calendar
- SOP: File:SOP_Plasmatherm_2014.pdf
- Maintenance: File:SOP_Plasmatherm_Maintenance_2014.pdf
- Electron-beam evaporator: Temescal FC-2000
- Owner: Martin Greve & Sabrina Eder
- Reservation: Temescal FC-2000 Reservation Calendar
- SOP: File:SOP_Temescal_EbeamEvaporator-1_2014.pdf
- Maintenance: File:SOP_Temescal_Maintenance_2014.pdf
- UV-lithography setup
- Spin-coater
- Owner: Martin Greve & Sabrina Eder
- Reservation: Spin Coater Reservation Calendar
- SOP: File:SOP_SpinCoater_2014.pdf
- Sputter coater
- Owner: Martin Greve & Sabrina Eder
- Reservation: no reservation needed
- SOP: File:SOP_Mini_SputterCoater_2023.pdf
- Thin-film characterization: Filmetrics F-10
- Owner: Martin Greve & Sabrina Eder
- Reservation: Filmetrics F-10 Reservation Calendar
- SOP: File:SOP_Filmetrics_2014.pdf
Procedures
- Lift-off
- Chrome wet-etch
- Owner: Martin Greve
- SOP: File:SOP_chromewetech_2014.pdf
- old link: Standard Operating Procedures
- old link: Available fabrication tools and facilities
Facilities
- Equipment in nanolab: File:Equipment in Nano-Lab_2015.pdf
Here is a description of the available facilities: File:Facilities_2014.pdf.
Here is a summary of the maintenance documents: File:Facilities_Maintenance-2014.pdf.
- De-ionized water unit and Neutraliser
- Cooling Water
- Nitrogen 5.0 Pressure Swing Adsorption Unit
- Air Conditioning/Ventilation
- Pressurized Air and Nitrogen Supply
- Sketch_NanoLab
- Equipment File:Nano-Lab equipment_2014.png
- Safety File:Nano-Lab safety_2014.png
- Power sockets/electricity File:Nano-Lab power sockets_2014.png
Chemicals and Consumables
- Waste/Disposal
- Available consumables/chemicals and supplier information
- Main chemicals which should be always available
- Ordering
Laboratory Documents
- Basic rules for the laboratory (Rules|Laboratory Code of Conduct/Clothing rules, Safety|Safety Guidelines and Information, Cleaning|Waste disposal)
- Declaration document_Laboratory
- Alarm signals and power failures
- General tasks for the laboratory
- To-do list: File:Tasks in the laboratory-general_2015.pdf
People
- Guideline for new employees/students at ift
PhD students
MSc-Students
Further Information
There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:
- MIT open course ware on nano processing [1]
- Resources at Chalmers (Swedish Nano-processing lab)[2]
- Useful recipes at Brigham Young University [3]
- Wikibook on Microtechnology [4]
Information on using MediaWiki
Consult the User's Guide for information on using the wiki software.