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* Reactive-ion etcher: Plasmatherm 790+
* Reactive-ion etcher: Plasmatherm 790+
** Owner: [[Xiaodong|Xiaodong Guo]]
** Owner: [[Martin|Martin Greve]]
** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]
** Reservation: [[Plasmatherm Calendar|Plasmatherm Reservation Calendar]]
** SOP: [[:File:SOP_Plasmatherm_2014.pdf]]
** SOP: [[:File:SOP_Plasmatherm_2014.pdf]]
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* Electron-beam evaporator: Temescal FC-2000
* Electron-beam evaporator: Temescal FC-2000
** Owner: [[Xiaodong|Xiaodong Guo]]
** Owner: [[Martin|Martin Greve]]
** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]
** Reservation: [[Temescal Calendar|Temescal FC-2000 Reservation Calendar]]
** SOP: [[:File:SOP_Temescal_EbeamEvaporator-1_2014.pdf]]
** SOP: [[:File:SOP_Temescal_EbeamEvaporator-1_2014.pdf]]
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* Sputter coater
* Sputter coater
** Owner: [[Xiaodong|Xiaodong Guo]]
** Owner: [[Martin|Martin Greve]]
** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]
** Reservation: [[Sputter Coater|Sputter Coater Reservation Calendar]]
** SOP: [[File:SOP_Sputter_Coater||Sputter Coater SOP]]
** SOP: [[File:SOP_Sputter_Coater||Sputter Coater SOP]]
Line 101: Line 101:
* [[Bodil|Bodil Holst]]
* [[Bodil|Bodil Holst]]
* [[Bjoern|Bjørn Samelin]]
* [[Bjoern|Bjørn Samelin]]
* [[Xiaodong|Xiaodong Guo]]
* [[Martin|Martin Greve]]
* [[Martin|Martin Greve]]
* [[Rachid|Rachid Maad]]
* [[Sabrina Eder]]
* [[Sabrina Eder]]
* [[Naureen Akhtar]]
* [[Naureen Akhtar]]
* [[Arivu Arivazhagan]]
* [[Melanie Ostermann]]
* [[Melanie Ostermann]]


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MSc-Students
MSc-Students
* [[Simen Askeland]]
* [[Erik Vedeler]]
* [[Truls Andersen]]
* [[Nikolai Frøvik]]
* [[Adrià Salvador Palau]]
* [[Espen Selfors]]





Revision as of 19:39, 1 November 2016

Wiki for UiB's NanoStructures Laboratory.

UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.

We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.

Equipment and Standard Operating Procedures (SOPs)

  • UV-lithography setup

Procedures

  • Lift-off


Facilities

Here is a description of the available facilities: File:Facilities_2014.pdf.

Here is a summary of the maintenance documents: File:Facilities_Maintenance-2014.pdf.

Chemicals and Consumables

Laboratory Documents


People


PhD students

MSc-Students


Further Information

There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:

  • MIT open courseware on nano processing [1]
  • Resources at Chalmers (Swedish Nano-processing lab)[2]
  • Useful recipes at Brigham Young University [3]
  • Wikibook on Microtechnology [4]

Information on using MediaWiki

Consult the User's Guide for information on using the wiki software.