Tools: Difference between revisions
No edit summary |
No edit summary |
||
Line 2: | Line 2: | ||
* [[E-line|Raith E-Line Electron Beam Lithography Tool]] | * [[E-line|Raith E-Line Electron Beam Lithography Tool]] | ||
* [[Temescal Electron-beam Evaporator|Temescal | * [[AFM|Jupiter AFM Oxford Instruments-Asylumn Research]] | ||
* [[Temescal Electron-beam Evaporator|Temescal FC200]] | |||
* [[Plasmatherm 790Plus|Plasmatherm 790 Plus Reactive-ion Etcher]] | * [[Plasmatherm 790Plus|Plasmatherm 790 Plus Reactive-ion Etcher]] | ||
* [[Cleanroom|ISO-class 5 cleanroom]] | * [[Cleanroom|ISO-class 5 cleanroom]] | ||
* [[Fumehood Cleanroom|Cleanroom Fumehood]] | * [[Fumehood Cleanroom|Cleanroom Fumehood]] | ||
* [[Fumehood Outerlab|Outerlab Fumehood]] | * [[Fumehood Outerlab|Outerlab Fumehood]] | ||
* [[Spinner| | * [[Spinner|Laurell WS-400BX-6NPP/Lite]] | ||
* [[Wafer Hotplate|Wafer Hotplate]] | * [[Wafer Hotplate|Wafer Hotplate]] | ||
* [[Sputter Coater|Sputter Coater (Gold Palladium Target)]] | * [[Sputter Coater|Emitec SC7620 Mini Sputter Coater (Gold Palladium Target)]] | ||
* [[Spectrometer|Filmetrics Transmission and Reflection Spectrometer for thin-film characterization]] | * [[Spectrometer|Filmetrics Transmission and Reflection Spectrometer for thin-film characterization]] | ||
Revision as of 06:26, 17 November 2023
The lab currently includes the following tools:
- Raith E-Line Electron Beam Lithography Tool
- Jupiter AFM Oxford Instruments-Asylumn Research
- Temescal FC200
- Plasmatherm 790 Plus Reactive-ion Etcher
- ISO-class 5 cleanroom
- Cleanroom Fumehood
- Outerlab Fumehood
- Laurell WS-400BX-6NPP/Lite
- Wafer Hotplate
- Emitec SC7620 Mini Sputter Coater (Gold Palladium Target)
- Filmetrics Transmission and Reflection Spectrometer for thin-film characterization
Lab Facilities: