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UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.
UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.


In addition we have several imaging and analysis tools like Optical Microscopes, an AFM, a Thin Film measurements system and a contact angle measurement system.  
In addition we have several imaging and analysis tools like Optical Microscopes, an AFM, a Thin Film measurements system and a Contact Angle measurement system.  


We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.  
We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.  

Revision as of 07:55, 1 December 2023

Wiki for UiB's NanoStructures Laboratory.

UiB's NanoStructures laboratory is equipped with modern thin-film processing, lithography equipment as well as several imaging tools. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.

In addition we have several imaging and analysis tools like Optical Microscopes, an AFM, a Thin Film measurements system and a Contact Angle measurement system.

We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.

Equipment and Standard Operating Procedures (SOPs)

  • Nanogroup lab-spaces: Clean room and chemical lab-spaces as well as characterisation tools
    • Primary staff: Martin Greve & Sabrina Eder
    • Access: to access the Nanogroup lab-spaces one requires an introduction and basic training by UiB personnel.

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  • Atomic Force Microscope: Jupiter AFM Oxford Instruments - Asylumn Research

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Procedures

  • Lift-off


Facilities

Here is a description of the available facilities (old): File:Facilities_2014.pdf.

Here is a summary of the maintenance documents (old): File:Facilities_Maintenance-2014.pdf.

Chemicals and Consumables

Laboratory Documents


People


PhD students


MSc-Students

Further Information

There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:

  • MIT open course ware on nano processing [1]
  • Resources at Chalmers (Swedish Nano-processing lab)[2]
  • Useful recipes at Brigham Young University [3]
  • Wikibook on Microtechnology [4]

Information on using MediaWiki

Consult the User's Guide for information on using the wiki software.

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