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= Welcome to the Wiki for UiB's NanoStructures Laboratory. = | |||
UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning. | UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning. | ||
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We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. | We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project. | ||
= Equipment = | == Equipment == | ||
* Electron-beam lithography: Raith e-Line | * Electron-beam lithography: Raith e-Line | ||
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* Electron-beam evaporator: Temescal FC-2000 | * Electron-beam evaporator: Temescal FC-2000 | ||
= Facilities = | == Facilities == | ||
= Standard Operating Procedures = | == Standard Operating Procedures == | ||
* [[Procedures|Standard Operating Procedures]] | * [[Procedures|Standard Operating Procedures]] | ||
= Laboratory Documents = | == Laboratory Documents == | ||
* [[Tools|Available fabrication tools and facilities]] | * [[Tools|Available fabrication tools and facilities]] | ||
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* [[Cleaning|Lab Cleaning Procedures]] | * [[Cleaning|Lab Cleaning Procedures]] | ||
= People = | == People == | ||
* [[Bodil|Bodil Holst]] | * [[Bodil|Bodil Holst]] | ||
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= Information on using MediaWiki = | |||
* [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list] | * [http://www.mediawiki.org/wiki/Manual:Configuration_settings Configuration settings list] | ||
Revision as of 12:51, 20 March 2012
Welcome to the Wiki for UiB's NanoStructures Laboratory.
UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.
We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.
Equipment
- Electron-beam lithography: Raith e-Line
- Reactive-ion etcher: Plasmatherm 790+
- Electron-beam evaporator: Temescal FC-2000
Facilities
Standard Operating Procedures
Laboratory Documents
- Available fabrication tools and facilities
- Laboratory Code of Conduct / Clothing rules
- Safety Guidelines and Information
- Lab Cleaning Procedures
People
- Bodil Holst
- Bjørn Samelin
- Thomas Reisinger
- Xiaodong Guo
- Martin Greve
- Rachid Maad
- Thomas Bolstad
- Thomas Håvardstun
- Jarand Gauteplass
Information on using MediaWiki
Consult the User's Guide for information on using the wiki software.