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* Electron-beam lithography: Raith e-Line
* Electron-beam lithography: Raith e-Line
** Owner: [[Erik|Erik Mannseth]]
** Owner: [[Martin|Martin Greve]]
** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]
** Reservation: [[E-Line Calendar|e-Line Reservation Calendar]]
** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]
** SOP: [[File:SOP_Raith_E-Line.doc||e-Line SOP]]
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* Spin-coater
* Spin-coater
** Owner: [[Erik|Erik Mannseth]]
** Owner: [[Martin|Martin Greve]]
** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]
** Reservation: [[Spin Coater Calendar|Spin Coater Reservation Calendar]]
** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]
** SOP: [[File:SOP_SpinCoater.doc||Spin Coater SOP]]
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* Thin-film characterization: Filmetrics F-10
* Thin-film characterization: Filmetrics F-10
** Owner: [[Erik|Erik Mannseth]]
** Owner: [[Martin|Martin Greve]]
** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]
** Reservation: [[Filmetrics F-10 Calendar|Filmetrics F-10 Reservation Calendar]]
** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]
** SOP: [[File:SOP_Filmetrics.doc||Filmetrics F-10 SOP]]
Line 58: Line 58:


* Chrome wet-etch
* Chrome wet-etch
** Owner: [[Erik|Erik Mannseth]]
** Owner: [[Martin|Martin Greve]]
** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]
** SOP: [[File:SOP_chromewetech.doc||Chrome wet-etch SOP]]


Revision as of 10:44, 10 January 2014

Wiki for UiB's NanoStructures Laboratory.

UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.

We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.

Equipment and Standard Operating Procedures (SOPs)

  • UV-lithography setup
  • Hotplates
  • Ultrasonic Bath
  • Lift-off


Facilities

Here is a description of the available facilities: File:Facilities.doc.

Here is a summary of the maintenance documents: File:Facilities Maintenance.doc.

Laboratory Documents

People

Further Information

There is a huge amount of information on Micro- and Nanofabrication on the web. Here are just some examples:

  • MIT open courseware on nano processing [1]
  • Resources at Chalmers (Swedish Nano-processing lab)[2]
  • Useful recipes at Brigham Young University [3]
  • Wikibook on Microtechnology [4]

Information on using MediaWiki

Consult the User's Guide for information on using the wiki software.

Retrieved from "http://nanolab.wiki.uib.no/index.php?title=Main_Page&oldid=579"