Tools: Difference between revisions

From Wiki for UiB's NanoStructures Laboratory
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* [[E-line|Raith E-Line Electron Beam Lithography Tool]]
* [[E-line|Raith E-Line Electron Beam Lithography Tool]]
* [[FC-2000|Temescal Electron-beam Evaporator]]
* [[Temescal Electron-beam Evaporator|Temescal Electron-beam Evaporator]]
* [[Plasmatherm 790Plus|Plasmatherm 790 Plus Reactive-ion Etcher]]
* [[Plasmatherm 790Plus|Plasmatherm 790 Plus Reactive-ion Etcher]]
* [[Cleanroom|ISO-class 5 cleanroom]]
* [[Cleanroom|ISO-class 5 cleanroom]]

Revision as of 11:20, 18 October 2011