Wiki for UiB's NanoStructures Laboratory.

UiB's NanoStructures laboratory is equipped with modern thin-film processing and lithography equipment. The lab is built around an electron-beam lithography tool (Raith e-Line) which can be used to pattern resist thin-films with minimal structure sizes of the order of 10 nanometer. The resist layers can be used to transfer the pattern into other thin-films that are either deposited using an electron-beam evaporator (Temescal FC-2000) or a spin-coater. For the pattern transfer a reactive-ion etcher (RIE, Plasmatherm 790+) is available as well as a wet-bench fumehood to perform wet-etch and lift-off processes. An improvised UV-exposure setup is available for crude patterning.

We use this WikiMedia site for documentation of all equipment, facilities and standard operating procedures of the laboratory. As a registered user of the laboratory you will receive permission to log into this site, which will allow you to contribute to the documentation and give information on the processes particular to your project.

Equipment and Standard Operating Procedures (SOPs)

Electron-beam lithography: Raith e-Line

E-Line Reservation Calendar

Reactive-ion etcher: Plasmatherm 790+

Electron-beam evaporator: Temescal FC-2000

UV-lithography setup

Spin-coater

Convection Oven

Hotplates

Ultrasonic Bath

Sputter coater

Thin-film characterization: Filmetrics F-10

Lift-off

Chrome wet-etch

old link: Standard Operating Procedures
old link: Available fabrication tools and facilities

Facilities

Laboratory Documents

People

Further Information

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